Short course on Atomic Layer Deposition
Location: Eindhoven
Date: April 20, 2017

Prof. Gregory Parsons (North Carolina State University) and Prof. Erwin Kessels (Eindhoven University of Technology) invite you to participate you in their short course on Atomic Layer Deposition (ALD), at the Eindhoven University of Technology on April 20, 2017. This course takes place in conjunction with the 2nd Area Selective Deposition workshop (ASD 2017), which will be held on April 21, 2017 in Eindhoven. The lectures will be given by both Parsons and Kessels but also by two guest speakers, Dr. Stephen Potts (University College London) and Dr. Harm Knoops (Oxford Instruments/Eindhoven University of Technology).

Course description

The short course provides an introduction into ALD by providing the basics of ALD, giving an overview of the applications of ALD and describing why ALD has become so important in recent years. Insight into ALD reactors and related equipment is given and a comparison is made between ALD and other thin film techniques. Elementary aspects of precursors and precursor delivery are addressed and important information on film nucleation and other ideal and non-ideal growth effects is provided. Also, plasma and other energy-enhanced ALD methods will be described and selected cases of issues related to ALD as well as its merits will be presented. Parts of the course are interactive, meaning that participants can share their experience and influence the contents of the course. There will also be ample time for questions during the course and/or in the breaks. After this course, the participants will have a good understanding of the principles of ALD and its technical details, not only in terms of (idealized) textbook examples but also in terms of the practical know-how important to work effectively with ALD.

Targeted audience

The short course is aimed at people that are relatively new to the field of ALD. This includes students, technologists and other people that work on or are planning to work on ALD but who have limited knowledge of the technology. Most specifically, the workshop is aimed at people in the Netherlands and neighboring countries.


Grand Café De Zwarte Doos, Eindhoven University of Technology (click here for directions).

Program & topics

08.45 - 09.15
Arrival with coffee/tea

09.15 - 09.30

09:30 - 12:30
Morning session (with 30 min. break)
1. ALD basics
2. History of ALD and ALD applications
3. ALD equipment
4. ALD vs. other thin film techniques (interactive session)

12.30 - 13.30

13.30 - 16.30
Afternoon session (with 30 min. break)
5. ALD precursors
6. Nucleation and other growth effects
7. Plasma and other energy-enhanced ALD techniques
8. Selected ALD issues and merits (interactive session)

16.30 - 17.00
Wrap up and closing


Prof. Gregory Parsons (North Carolina State University, biography)
Prof. Erwin Kessels (Eindhoven University of Technology, biography)
Dr. Stephen Potts (University College London, biography)
Dr. Harm Knoops (Oxford Instruments /Eindhoven University of Technology, biography)

This ALD short course takes place in the framework of NanoLabNL, which is a Dutch national facility for nanotechnology research.